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CNFABMContactAlligner
ABM Contact Aligner Description Dual camera manual alignment exposure tool for 4" wafers using 4" photomasks CNF Tool Page: ABM Contact Aligner Notes * Follow i...
CNFHeidelbergDWL2000
Heidelberg DWL 2000 Description Exposure tool that uses laser and interferometer controlled stage to direct write onto photoresist coated quartz chrome photomask...
CNFHotStripBath
Hot Strip Bath Description Heated baths of organic solvents which breakdown photoresist. CNF tool page: Resist Hot Strip Bath Notes * There are three baths, ...
CNFManualPRSpinner
Manual Spinner Description Spinning vaccum chuck for coating wafers with primer or photoresist Notes * Primer: P20 * Photoresist: SPR 220 3.0 * Speed: 25...
DoubleLayerARCoatings
Double Layer AR Coatings Page for recording imformation on recipes and fabrication runs used for the development of double layer silicon AR Coatings at CNF. Sili...
r17 - 09 Mar 2020 - 22:43 by BugaoZou
FTSCooldown20180821
Cooldown Metrics Pump gaurd and pre cool cryostat Action Time Notes Begin roughing on closed cryostat line Open tee up to gauge Open te...
FTSCooldown20180912
Cooldown Metrics Pump gaurd and pre cool cryostat Action Time Notes Begin roughing on closed cryostat line 7:30am Open tee up to gauge ...
SDDilutionRefrigeratorInfo
BlueFors SD250 Most Recent Base Metrics Notes CH1 Temperature w/ 632 uV excitation (K) CH2 Temperature w/ 632 uV excitation (K) CH5 Temperature w/ 20 uV ...
r93 - 02 Apr 2024 - 11:29 by CodyDuell
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Number of topics: 9
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